Now showing items 1-1 of 1

    • Membrane facilitated separation of NF3 and CF4 

      Branken, David Jacobus (North-West University, 2013)
      Nitrogen trifluoride (NF3) is frequently used as a source of fluorine in the electronics device manufacturing industry as a dry etchant during plasma assisted etching of silicon wafers, or during the plasma cleaning of ...